EE 143. Microfabrication Technology

Current Schedule (Fall 2016)


Catalog Description: (4 units) Integrated circuit device fabrication and surface micromatching technology. Thermal oxidation, ion implantation, dopant diffusion, film deposition, epitaxy, lithography, etching, contacts and interconnections, and process integration issues. Device design and mask layout, relation between physical structure and electrical/mechanical performance. MOS transistors and MEMS microstructures will be fabricated in the laboratory and characterized.

Prerequisites: Physics 7B, EECS 40.

Course objectives: Process integration design of MOS and MEMS devices based on fabrication modules. To establish relationships between process parameters and device parameters. Implementation of fabrication and testing methodologies in laboratory.

Topics covered:

General Catalog