Faculty Publications - Kameshwar Poolla

Book chapters or sections

  • N. Ma, J. Ghan, S. Mishra, C. J. Spanos, K. Poolla, N. Rodriguez, and L. Capodieci, "Automatic hotspot classification using pattern-based clustering," in Design for Manufacturability through Design-Process Integration II, V. K. Singh and M. L. Rieger, Eds., Proceedings of SPIE, Vol. 6925, Bellingham, WA: SPIE -- Society of Photo-Optical Instrumentation Engineers, 2008, pp. 05-1-10.
  • Q. Zhang, K. Poolla, and C. J. Spanos, "Modeling of mask thermal distortion and its dependency on pattern density," in Photomask and Next-Generation Lithography Mask Technology XII, M. Komuro, Ed., Proceedings of SPIE, Vol. 5853, Bellingham, WA: SPIE -- Society of Photo-Optical Instrumentation Engineers, 2005, pp. 234-242.
  • Q. Zhang, C. Tang, T. Hsieh, N. Maccrae, B. Singh, K. Poolla, and C. J. Spanos, "Comprehensive CD uniformity control across lithography and etch," in Metrology, Inspection, and Process Control for Microlithography XIX, R. M. Silver, Ed., Proceedings of SPIE, Vol. 5752, Bellingham, WA: SPIE -- Society of Photo-Optical Instrumentation Engineers, 2005, pp. 692-701.
  • Q. Zhang, P. D. Friedberg, C. Tang, B. Singh, K. Poolla, and C. J. Spanos, "Across-wafer CD uniformity enhancement through control of multizone PEB profiles," in Metrology, Inspection, and Process Control for Microlithography XVIII, R. M. Silver, Ed., Proceedings of SPIE, Vol. 5375, Bellingham, WA: SPIE -- Society of Photo-Optical Instrumentation Engineers, 2004, pp. 276-286.

Articles in journals or magazines

Articles in conference proceedings

Technical Reports

Patents