Juliet Rubinstein (formerly Juliet Holwill)

EECS Graduate Student

 

 

Hi!  I’ve been a graduate student in the EECS department at UC Berkeley since Fall 2004.  I’m from Melbourne, Australia, and completed my Bachelor of Science (Computer Science) and Bachelor of Engineering (Computer Engineering) at The University of Melbourne.  In January 2004 I traveled to Pittsburgh, Pennsylvania, to attend Carnegie Mellon University on a student exchange.  My current interests lie in CAD research for lithography, in particular pattern matching for double patterning lithography.  My research advisor is Prof. Andrew Neureuther.  I am a past co-president of the WICSE at Berkeley.  I’ve interned at AMD with Jongwook Kye in Harry Levinson’s lithography research group, and also at Mentor Graphics on pattern matching.  I’m currently supported by the Intel Foundation Fellowship.  I can be found in Cory Hall Office 550.

 

 

 

Publications

 

  1. J. Rubinstein, A. Neureuther,  “Through-focus pattern matching applied to double patterning”, to appear in SPIE Advanced Lithography Proceedings 2009.

  2. Wojtek J. Poppe, Andrew R. Neureuther, Patrick Au, Darshana Jayasuriya, Juliet A. Rubinstein, “Tiny footprint programmable electric defocus monitors”, to appear in SPIE Advanced Lithography Proceedings 2009.

  3. J. Rubinstein, A. Neureuther,  “Post Decomposition Assessment of Double Patterning Layout ,” SPIE Optical Microlithography XXI, February 2008.
    WINNER OF BEST STUDENT PAPER AWARD
  4. J. Rubinstein, A. Neureuther,  “Images in Photoresist for self-interferometric electrical image monitors,” Proceedings of the SPIE, Volume 6730, pp. 673039 (2007)
  5. Marshal Miller, Andrew Neureuther, Daniel Ceperley, Juliet Rubinstein, Koji Kikuchi, “Characterization and monitoring of photomask edge effects,” SPIE/BACUS Photomask Technology, September 2007

 

  1. J. Holwill, and A. Neureuther, “DRC Friendly Pattern and Probe Aberration Monitors,” SPIE Microlithography - Design and Process Integration, March, 2007.

 

  1. J. Holwill, Kye, J and Zou, Y, “Statistical Analysis of Gate CD Variation for Yield Optimization,” SPIE Microlithography - Design and Process Integration, March, 2007.

 

  1. E. Chin, J. Holwill, and A. Neureuther, “Prediction of Interconnect Delay Variations using Pattern Matching,” SPIE Microlithography - Design and Process Integration, March, 2007.

 

  1. W. J. Poppe, J. A. Holwill, P. D. Friedberg, L. Alarcon, L. Pang, Q. Liu, A. R Neureuther, “Transistor-based electrical test structures for lithography and process characterization,” SPIE Microlithography - Design and Process Integration, March, 2007.

 

  1. Andy Neureuther, Wojtek Poppe, Juliet Holwill, Eric Chin, Lynn Wang, Jae-Seok Yang, Marshal Miller, Dan Ceperley, Chris Clifford, Koji Kikuchi, Jihong Choi, Dave Dornfeld, Paul Friedberg, Costas Spanos, John Hoang, Jane Chang, Jerry Hsu, David Graves, Alan C. F. Wu, and Mike Lieberman, “Collaborative platform, tool-kit, and physical models for DfM,” SPIE Microlithography, March 2007

  2. J. Holwill, and A. Neureuther, “Self-Interferometric Electrical Image Monitors,” SPIE Microlithography - Design and Process Integration, February, 2006.

 

  1. J. Holwill, G. McIntyre, W. Poppe, and A. Neureuther, “Layout ‘Hot Spots’ for Advancing Optical Technologies” SPIE Microlithography - Design and Process Integration, February, 2006.

 

  1. G. McIntyre, J. Holwill, A. Neureuther, L. Capodieci, Y. Zou, H. Levinson, and J. Kye, “Screening layouts for high-NA polarization effects using pattern matching,” J. Vac Sci. Technol., (presented at EIPBN, Orlando, FL, May, 2005). 

 

 

 

Courses

 

Spring 2008

 

German 4         Intermediate German II

 

Fall 2007

 

CS294             Reading the Classics (Prof. Christos Papadimitriou)

ENGIN 298A  The Future of Information Technology (Prof. Reza Moazzami)

German 3         Intermediate German I

 

Spring 2007

 

ENGIN 298A  Marketing for High-Tech Entrepreneurs (Prof. Andrew Isaacs)

CS250             VLSI Systems Design (Prof. John Wawrzynek)

German 2         Elementary German II

 

Fall 2006

 

ENGIN 298A  Marketing for High-Tech Entrepreneurs (Prof. Andrew Isaacs)

German 1         Elementary German I

 

Spring 2006

 

CS270             Combinatorial Algorithms and Data Structures (Prof. Satish Rao)

CS294-5          Great Algorithms (Prof. Richard Karp)

 

Fall 2005

 

STAT 200A     Introduction to Probability and Statistics at an Advanced Level (Prof. Tai Melcher)

EE290H           Special Issues in Semiconductor Manufacturing (Prof. Costas Spanos)

 

Spring 2005

 

EE219B           Logic Synthesis and Verification (Prof. Andreas Kuehlmann)

EE290A           Sequential Logic Synthesis and Verification (Prof. Robert Brayton)

 

Fall 2004

EE244              Computer-Aided Design of Integrated Circuits (Prof. Kurt Keutzer)

CS164             Programming Languages and Compilers (Prof. Rastislav Bodik)

CS61B             Data Structures (GSI) (Prof. Paul Hilfinger)

 

 

Teaching


Fall 2004: CS61b

 

 

 

Personal

 

My husband, Ben Rubinstein, is also here in Cal EECS.  See our wedding website: Ben Rubinstein and Juliet Holwill's wedding website.

 

I have been learning German since 2006, and am now at an intermediate level.  I enjoy traveling to Germany to experience the culture and practice the language! 

 

I took ballet for 3 semesters at Berkeley.

 

Personal Photo Album.

 

 

 

 

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   Last Updated August 2008